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CONFERENCE PROGRAMME
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- PLENARY SESSION
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- SYMPOSIUM A -
Photo-Excited Processes & Applications
("3-ICPEPA")
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- SYMPOSIUM B -
Protective Coatings & Thin Films 99
- Joint
Symposium with Société Française du Vide
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- SYMPOSIUM C -
Progress in Computational Materials Science
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- SYMPOSIUM D -
Measurement Techniques for Technological Plasmas
- Joint
Symposium with FEMS - Plasma and Ion Surface Engineering
(PISE) Committee UK
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- SYMPOSIUM E -
Advances in Silicon Substrates
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- SYMPOSIUM F - Process
Induced Defects in Semiconductors
- Joint
Symposium with FEMS
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- SYMPOSIUM G -
Material Physics Issues & Applications of Magnetic
Oxides
- Joint
Symposium with European Physical Society-CMD
- Joint
Symposium with FEMS
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- SYMPOSIUM H - Strain
in Materials: Analysis, Relaxation & Properties
- Joint
Symposium with FEMS
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- SYMPOSIUM I -
Microcrystalline & Nanocrystalline Semiconductors
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- SYMPOSIUM J -
Materials for Coherent Optics
- Joint
Symposium with European Photonics Association
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- SYMPOSIUM K -
Materials, Process and Technology for Optical
Interconnect
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- SYMPOSIUM L -
Ab-Initio Approaches to Microelectronics Materials and
Process Modelling
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- SYMPOSIUM M - Basic
Models to Enhance Reliability in Si-Based Devices and
Circuits
- Joint
Symposium with Deutsche Materialwissenschaftliche
Gesellschaft, Cottbus e.V. (DeMaWiG)
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- SYMPOSIUM N -
Molecular Optoelectronics: Materials, Physics and Devices
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- SYMPOSIUM O -
Chalcogenide Semiconductors for Photovoltaics
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- SYMPOSIUM P - Optical
Characterization of Semiconductor Layers and Surfaces
