This Symposium continues the annual meetings in the area of photo-processing that have been held almost continuously in Strasbourg since the inception of the EMRS. There will be 4 days of sessions dedicated to a wide range of topics related to new developments in the area of photo-induced material processing. The major emphasis will still center around deposition, surface treatment processes and diagnostics. However, novel applications such as nanophase formation, micromachining, UV and VUV applications as well as rapid thermal processing by means of lamps will be encouraged. The meeting is intended for researchers and development engineers add (in academia and industry) involved in experimental, modeling and theoretical aspects of photo-assisted processes with current and future applications in microelectronics, optoelectronics, metallurgy, surface science and large area devices. Most invited speakers will be suggested by the chairmen and advisory committee, but further invitations will arise from the best abstracts submitted. In addition to the invited speakers, those presenting further contributions addressing these subjects are invited to submit contributed papers for oral and poster presentations to be published in an archived and refereed journal.

Symposium Organizers: