Session 9: Poster Session
@
Wednesday, June 6, 15:55-17:55, 10F Room 1004-7
Chairperson: K.T. Kornegay, Conell Univ.
T. Ise, Osaka Univ.
@
9.1 Dependence of Turn-On and Turn-Off Characteristics on Anode/Gate Geometry of High-Voltage 4H-SiC GTO Thyristors
J.B. Fedison, T.P. Chow, M. Ghezzo* and J.W. Kretchmer*
Rensselaer Polytechnic Institute and *GE Corporate R&D
9.2 Design Consideration for 2kV SiC-SIT
H. Onose, T. Yatsuo, A. Watanabe, T. Yokota, T. Ishikawa, I. Sanpei, T. Someya and Y. Kobayashi
Hitachi, Japan
9.3 Large Area 4H-SiC Power MOSFETs
A. Agarwal, S.-H. Ryu, M. Das, L. Lipkin, J. Palmour and N. Saks*
Cree and *Naval Research Laboratory, U.S.A.
9.4 Influence of Device and Circuit Parameters on the Switching Losses of an Ultra Fast CoolMOS/SiC-Diode Device-Set: Simulation and Measurement
J. Petzoldt, T. Reinmann and L. Lorenz*
Ilmenau Technical Univ. and *Infineon Technologies, Germany
9.5 Comparison and Optimization of Edge Termination Techniques for SiC Power Devices
D.C. Sheridan, G. Niu, J.N. Merrett and J.D. Cressler
Auburn Univ., U.S.A.
9.6 High Frequency Application of High Transconductance Surface-Channel Diamond Field-Effect Transistors
H. Umezawa, H. Taniuchi, T. Arima, Y. Ohba, M. Tachiki and H. Kawarada
Waseda Univ., Japan
9.7 Thyristor with Integrated Forward Recovery Protection Function
F.-J. Niedernostheide, H.-J. Schulze and U. Kellner-Werdehausen*
Infineon and *Eupec, Germany
9.8 Short on-Pulse Reverse Recovery Behavior of Free Wheeling Diode (FWD)
F. Nagaune, T. Miyasaka, S. Tagami* H. Shigekane and H. Kirihata*
Fuji Hitachi Power Semiconductor and *Fuji Electric, Japan
9.9 A New BRT (Base Resistance Controlled Thyristor) Employing Trench Gate and Self-Align Corrugated P-Base
J.-K. Oh, M.-S. Lim, B.-C. Jeon, M.-K. Han and Y.-I. Choi*
Seoul National Univ. and *Ajou Univ., Korea
9.10 A 6kV Thyristor Fabricated by Direct Wafer Bonding
K.D. Hobart, F.J. Kub, D. Pattanayak*, D. Piccone*, M. Patel*, D. Hits*, R. Rodrigues*, G. Ayele** and C.A. Colinge**
Naval Research Laboratory, *Silicon Power and **California State Univ., U.S.A.
9.11 A Novel 6.5 kV IGCT for High Power Current Source Inverters
A. Weber, P. Kern and T. Dalibor
ABB Semiconductors, Switzerland
9.12 Impacts of Channel Implantation on Performance of Static Shielding Diodes and Static Induction Rectifiers
K. Yano, N. Hattori, Y. Yamamoto and M. Kasuga
Yamanashi Univ., Japan
9.13 Modeling of Ion-Induced Charge Generation in High Voltage Power Devices
W. Kaindl, G. Solkner*, P. Voss** and G. Wachutka
Munich Univ. of Technology, *Infineon Technologies and **EUPEC, Germany
9.14 Fine Pattern Effect Leakage Current and Reverse Recovery Characteristics of MPS Diode
T. Naito, M. Nemoto, A. Nishiura, M. Otsuki*, M. Kirisawa* and Y. Seki*
Fuji Electric R&D and *Fuji Electric, Japan
9.15 Power Diodes with Active Control of Emitter Efficiency
D. Druecke and D. Silber
Univ. of Bremen, Germany
9.16 A Fast & Soft Recovery Diode with Ultra Small Qrr (USQ-Diode) Using Local Lifetime Control by He Ion Irradiation
K. Nishiwaki, T. Kushida and A. Kawahashi
Toyota Motor, Japan
9.17 Low-Voltage SiGe Power Diodes
G.A.M. Hurkx, E.A. Hijzen, M.A.A. in 't Zandt
Philips Research Laboratories, The Netherlands
9.18 100V Trench MOS Barrier Schottky Rectifier Using Thick Oxide Layer (TO-TMBS)
T. Shimizu, S. Kunori, M. Kitada and A. Sugai
Shindengen Electric Mfg., Japan
9.19 Lateral SOI Static Induction Rectifier
K. Yano, S. Honarkhah* and C.A.T. Salama*
Yamanashi Univ., Japan and *Univ. of Toronto, Canada
9.20 Flip Chip Power MOSFET: A New Wafer Scale Packaging Technique
A. Arzumanyan, R. Sodhi, D. Kinzer. H. Schofield and T. Sammon
International Rectifier, U.S.A.
9.21 A 700V Lateral Power MOSFET with Narrow Gap Double Metal Field Plates Realizing Low On-Resistance and Long-Term Stability of Performance
N. Fujishima, M. Saito*, A. Kitamura*, Y. Urano*. G. Tada* and Y. Tsuruta*
Fuji Electric R&D and *Fuji Electric, Japan
9.22 60V Field NMOS and PMOS Transistors for the Multi-Voltage System Integration
T. Terashima, F. Yamamoto, K. Hatasako and S. Hine
Mitsubishi Electric, Japan
9.23 High Voltage Device Implementation in 0.5ƒÊm LBC6 (BiCMOS-Power) Technology
S. Pendharkar, T. Debolske, T. Efland, W. Leitz, W. Nehrer, J. Smith and R.V. Taylor
Texas Instruments, U.S.A.
9.24 Low On-Resistance SOI Power MOSFET Using Dynamic Threshold (DT) Concept for High Efficient DC-DC Converter
Y. Hiraoka, S. Matsumoto and T. Sakai
NTT, Japan
9.25 Smart PWM Driver in SO-8 for Automotive Solenoid Controls
K. Yoshida, S. Kiuchi, H. Tobisaka, N. Yaezawa, T. Ohe, S. Furuhata and T. Fujihira
Fuji Hitachi Power Semiconductor, Japan
9.26 Mechanism of Power Dissipation Capability of Power MOSFET Devices: Comparative Study between LDMOS and DMOS Transistors
Y.S. Chung, O. Valenzuela and B. Baird
Motorola, U.S.A.
9.27 A Half-Bridge Driver IC with Newly Designed High Voltage Diode
K. Watabe, K. Shimizu, H. Akiyama, T. Araki, J. Moritani and M. Fukunaga
Mitsubishi Electric, Japan
9.28 Recessed Trench MOSFET Process without Critical Alignments Makes Very High Densities Possible
A. Finney, J. Evans*, P. Blair, J. Earnshaw, P. Jerred, K. Lowe, D. Mottram and A. Wood
Zetex and *Totem Semiconductors, U.K.
9.29 Optimization of Safe-Operating-Area Using Two Peaks of Body-Current in Submicron LDMOS Transistors
S.K. Lee, J.H. Kim, Y.C. Choi, C.J. Kim, H.S. Kang and C.S. Song
Fairchild Semiconductor, Korea
9.30 Charge Model for SOI LDMOST with Lateral Doping Gradient
N. D'Halleweyn, L. Tiemeijer*, J. Benson and W. Redman-White
Univ. of Southampton, U.K. and *Philips Research Laboratories, The Netherlands
9.31 A Dual-Voltage Self-Clamped IGBT for Automotive Ignition Application
Z.J. Shen and S.P. Robb*
Univ. of Michigan-Dearborn and *ON Semiconductor, U.S.A.
9.32 Wide Cell Pitch 1200V NPT CSTBTs with Short Circuit Ruggedness
H. Nakamura, K. Nakamura, S. Kusunoki, H. Takahashi, Y. Tomomatsu, M. Harada and S. Hine
Mitsubishi Electric, Japan
9.33 An Ignition IGBT with Smart Functions in Chip on Chip Technology
L. Leipold, H. Fischer, W. Kanert, J. Kositza, T. Theobald and C. Xu
Infineon Technologies, Germany
9.34 Great Improvement in IGBT Turn-On Characteristics with Trench Oxide PiN Schottky (TOPS) Diode
M. Nemoto, M. Otsuki*, M. Kirisawa*, Y. Seki*, T. Naito, R.N. Gupta**, C.R. Winterhalter** and H.-R. Chang**
Fuji Electric R&D, *Fuji Electric, Japan and **Rockwell Science Center, U.S.A.
9.35 The Influence of Body Effect on the Short Circuit Ruggedness of Emitter Ballasted IGBTs
P.M. Shenoy, G.M. Dolny and A. Bhalla
Intersil, U.S.A.
9.36 High-Functionality Compact Intelligent Power Unit (IPU) for EV/HEV Applications
G. Majumdar, K.H. Hussein*, K. Takanashi, M. Fukada, J. Yamashita, H. Maekawa, M. Fuku, T. Yamane and T. Kikunaga
Mitsubishi Electric and *Fukuryo Semicon Engineering, Japan
9.37 Soft-Switching Turn-off Characterization at High Temperature of 1200V Trench IGBT Using Local Lifetime Control
S. Azzopardi, A. Kawamura and H. Iwamoto*
Yokohama National Univ. and *Mitsubishi Electric, Japan
9.38 A Novel, 1.2kV Trench Clustered IGBT with Ultra High Performance
O. Spulber, M. Sweet, K. Vershnin, N. Luther-King, M.M. de Souza and E.M.S. Narayanan
De Montfort Univ., U.K.
9.39 Destruction Mechanism of PT and NPT-IGBTs in the Short Circuit Operation Which Can Explain Various Kinds of Simulated Results
I. Takata
Mitsubishi Electric, Japan
9.40 A Study of GTBT Characteristics Driven by Pulse Current
K. Throngnumchai, Y. Shimoida, T. Karaki and H. Kaneko
Nissan Motor, Japan
9.41 Failure Mechanisms of SOI High-Voltage LIGBTs and LDMOSFETs under Unclamped Inductive Switching
D.M. Garner, F. Udrea, G. Ensell*, K. Sheng, A.E. Popescu, G.A.J. Amaratunga and W.I. Milne
Univ. of Cambridge and *Univ. of Southampton, U.K.
9.42 Design Consideration of 1000V Merged Pin Schottky Diode Using Superjunction Sustaining Layer
E. Napoli, A.G.M. Strollo
Univ. of Naples "Federico II", Italy
9.43 New Benchmark for RESURF, SOI, and Super-Junction Power Devices
R.P. Zingg
Philips Semiconductors, The Netherlands
9.44 A 650V Rated RESURF-Type LDMOS Employing an Internal Clamping Diode for Induced Bulk Breakdown without EPI or Buried Layer
M.H. Kim, J.J. Kim and Y.S. Choi
Fairchild Semiconductor, Korea
9.45 Multiring Active Analogic Protection for Minority Carrier Injection Suppression in Smart Power Technology
O. Gonnard, G. Charitat, M. Bafleur, P. Lance*, M. Suquet**, J.P. Laine and A. Peyre-Lavigne
LAAS/CNRS, *Motorola and **Siemens Automotive, France
9.46 800V/1A, 1-Chip Process for Battery Charger IC
C.K. Jeon, J.J. Kim, Y.S. Choi, M.H. Kim, S.L. Kim, H.S. Kang and C.S. Song
Fairchild Semiconductor, Korea
9.47 Investigation of the Gate Dielectric Oxidation Treatment in Trench Gate Power Devices
M.-J. Lin, C.-W. Liaw, J.-J. Chang, F.-L. Zhang, T.-K. Yen and H.-C. Cheng
National Chiao Tung Univ., Taiwan
9.48 Fabrication of High Aspect Ratio Doping Region by Using Trench Filling Epitaxial Si Growth
S. Yamauchi, Y. Urakami, N. Tsuji and H. Yamaguchi
Denso, Japan
9.49 The Monolithic Bidirectional Switch (MBS) in a Matrix Converter Application
F. Heinke and R. Sittig
Technische Univ. Braunschweig, Germany
9.50 Soft-Switching Type Multiple-Chip Power Device (M-Power)
H. Ota, Y. Minoya, N. Terasawa, K. Kuwabara, S. Igarashi*, Y. Nishikawa* and T. Nozawa
Fuji Hitachi Power Semiconductor and *Fuji Electric R&D
9.51 A Novel Gate Drive Circuit for Low-loss System Using IGBT Saturation Voltage Characteristics
S. Takizawa, S. Igarashi and K. Kuroki
Fuji Electric R&D, Japan
9.52 Physics-Based Dynamic Electro-Thermal Models of Power Bipolar Devices (Pin Diode and IGBT)
P.M. Igic, P.A. Mawby and M.S. Towers
Univ. of Wales Swansea, U.K.
9.53 Using Two-Dimensional Structures to Model Filamentation in Semiconductor Devices
P.L. Hower and S. Pendharkar
Texsas Instruments, U.S.A.