Session 5: RF Devices
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Tuesday, June 5, 10:45-12:20, 5F Main Hall
Chairperson: C.A.T. Salama, Univ. of Toronto
T. Yachi, NTT
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5.1 A High-efficiency 5-GHz-band SOI Power MOSFET Having a Self-aligned Drain Offset Structure
S. Matsumoto, Y. Hiraoka and T. Sakai
NTT, Japan
5.2 High Performance Stacked LDD RF LDMOSFET
J. Cai, C. Ren, N. Balasubramanian and J.K.O. Sin*
Institute of Microelectronics, Singapore and *Hong Kong Univ. of Science and Technol., China
5.3 High Power LDMOS for Cellular Base Station Applications
M. Shindo, M. Morikawa, T. Fujioka, K. Nagura, K. Kurotani, K. Odaira, T. Uchiyama* and I. Yoshida
Hitachi and *Hitachi Tobu Semiconductor, Japan
5.4 A High Efficiency High Power GaAs Push-Pull FET for W-CDMA Base Stations
K. Inoue, K. Ebihara, H. Haematsu, F. Yamaki, T. Igarashi, H. Takahashi and J. Fukaya
Fujitsu Quantum Devices, Japan