TUTORIAL TRACK: Reliability Fundamentals
Sunday, April 7
Room: Landmark A
111. Intro ReliabilityTim Rost & Vijay Reddy, TI (8:00 11:30)
112. Gate Oxide ReliabilityEric Vogel, NIST (1:30 3:00)
113. ESDCharvaka Duvvury, TI (3:30 5:00)
Room: Landmark B
121. Radiation Induced Soft Errors in Silicon Components &
Computer SystemsJose Maiz, Intel, Bob Baumann, TI et al.(8:00 5:00)
Room: Landmark C
131. Errors and ReliabilityKristof Croes, Xpeqt AG and Luc Tielemanns (8:00 9:30)
132. Trends in Failure AnalysisLarry Wagner, Texas Instruments (10:00 11:30)
133. New Phenomena in the Device Reliability Physics of
Advanced Submicron CMOS Technologies (NBTI)
Giuseppe La Rosa, IBM (1:30 5:00)
Room: Landmark D
141. The basics of Electromigration with a view towards
Cu dual-damascene reliabilityEnnis Ogawa, TI (8:00 9:30)
142. Introduction to Predictive WLREric Snyder, Sandia Technologies (10:00 11:30)
143. Defect Reliability Statistics with RedundancyGlenn Shirley, Intel (1:30 3:00)