S. Bychikhin, M. Litzenberger, R. Pichler, D. Pogany, E. Gornik , "Thermal and free carrier laser interferometric mapping and failure analysis of anti-serial smart power ESD protection structures", ESREF'2001, pp. 1501-1506
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Titre : S. Bychikhin, M. Litzenberger, R. Pichler, D. Pogany, E. Gornik , Thermal and free carrier laser interferometric mapping and failure analysis of anti-serial smart power ESD protection structures, ESREF'2001, pp. 1501-1506

Cité dans : [DATA227] ESREF'2001, 12th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis, Arcachon, France , 1-5 octobre 2001.
Auteur : S. Bychikhin
Auteur : M. Litzenberger
Auteur : R. Pichler
Auteur : D. Pogany
Auteur : E. Gornik

Adresse : Vienna University of Technology - Austria
Source : ESREF'2001 - 12th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis - Arcachon - France.
Date : 1-5 octobre 2001
Site : http://www.elsevier.com/locate/microrel
Pages : 1501 - 1506
Lien : private/BYCHIKHIN.pdf - 6 pages, 100 Ko.

Abstract :
Thermal and free carrier distribution during electrostatic discharge (ESD) - like stress are investigated in anti-serial
smart power technology ESD protection devices by using a laser interferometry mapping technique. The
temperature- and free carrier - induced phase shift along the device length and width is studied as a function of stress
current. Two positive phase peaks due to heat dissipation caused by a vertical and a lateral current path are found
under the emitter contact and in the middle of the structure of an active npn transistor, respectively. A negative
phase peak is found at the position of the forward biased pn junction of an inactive transistor, where a high carrier
injection occurs. The positions of hot spots obtained from the thermal mapping method are correlated with the
results of physical failure analysis using the infrared microscopy.


Bibliographie

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[8] : Fürböck C, Esmark K, Litzenberger M, Pogany D, Groos G, Zelsacher R, Stecher M, and Gornik E, "Thermal and free carrier concentration mapping during ESD event in smart power ESD protection devices using an improved laser interferometric technique", Microel. Reliab., Vol. 40, 2000, pp. 1365-1370.
[9] : Litzenberger M., Esmark K, Pogany D, Fürböck C, Gossner H, Gornik E and Fichtner W, "Study of triggering inhomogeneities in gg-nMOS ESD protection devices via thermal mapping using backside laser interferometry", Microel. Reliab., Vol. 40, 2000, pp.1359-1364.
[10] : Pogany D, Seliger N, Litzenberger M, Gossner H, Stecher M, Müller-Lynch T, Werner W and Gornik E, "Damage analysis in smart power technology electrostatic discharge (ESD) protection devices", Microel. Reliab., vol. 39, 1999, pp. 1143-1148.

  [1] : [SHEET485] H. Gossner, T. Müller-Lynch, K. Esmark, M. Stecher, Wide range control of the sustaining voltage of ESD protection elements realized in a smart power technology, Proc. EOS/ESD Symp. (1999) 19-27.


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